ALD features superb step coverage performance. The SEM images show

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Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels - Physical Chemistry Chemical Physics (RSC Publishing) DOI:10.1039/D0CP03358H

Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition

Recent advances in in situ and operando characterization techniques for Li 7 La 3 Zr 2 O 12 -based solid-state lithium batteries - Materials Horizons (RSC Publishing) DOI:10.1039/D3MH00135K

Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si - ScienceDirect

SEM images of the surfaces at different number of ALD cycles on Si(100)

Transmission electron microscopy (TEM) images for step coverage of the

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